| 摘要 |
<p>The invention concerns an elementary analysis device by optical emission spectrometry on plasma produced by laser, comprising a pulsed laser source (6), means (8, 10, 12) focusing the light from said source onto an object to be analysed (2), to produce plasma on the surface of the object, means (16, 18) for analysing a spectrum of the plasma radiation, means (20) for determining, from said analysis, the elementary composition of the object, and optional means (4) for moving the object. The invention is useful in particular for controlling radioactive materials.</p> |
