| 摘要 |
<p>The present invention provides electrodepositable compositions that in the absence of a microorganism control agent electrodeposit upon a surface of an electroconductive substrate as a substantially smooth film and which upon the addition of a microorganism control agent mixture of 5-chloro-2-methyl-4-isothiazolin-3-one and 2-methyl-4-isothiazolin-3-one result in an electrodepositable composition that upon electrodeposition onto the surface of the electroconductive substrate produces a comparatively rougher film, wherein all or a portion of the mixture of 5-chloro-2-methyl-4-isothiazolin-3-one and 2-methyl-4-isothiazolin-3-one is replaced with an aliphatic hydrocarbon material selected from halonitroalkanes, halonitroalkenes, hydroxyalkyl substituted nitroalkanes and mixtures thereof resulting in an electrodepositable compositions that upon electrodeposition onto the surface of the electroconductive substrate produce a substantially smooth film. Aqueous compositions for rinsing electrocoated substrates and processes including such aliphatic hydrocarbon materials are also disclosed.</p> |
