发明名称 MEMORY WITH A TRENCH CAPACITOR AND A SELECTION TRANSISTOR AND METHOD FOR PRODUCING THE SAME
摘要 The invention comprises a memory with a storage cell (100) that is formed in a substrate (105) and consists of a trench capacitor (110) and a transistor (160). The trench capacitor (110) is connected to the transistor (160) with a self-aligned connection (220). The transistor (160) at least partially covers said trench capacitor (110). The trench capacitor (110) is filled with a conductive trench filling and an insulating cover layer (135) is located on said conductive trench filling (130). An epitaxy layer (245) is located above said insulating cover layer (135). The transistor (160) is formed in said epitaxy layer (245). The self-aligned connection (220) is formed in a contact trench (205) and consists of an insulation collar (235) into which a conductive material (225) is introduced. A conductive cap (230) is formed on said conductive material.
申请公布号 WO0117019(A3) 申请公布日期 2001.05.10
申请号 WO2000DE02866 申请日期 2000.08.23
申请人 INFINEON TECHNOLOGIES AG;TEMMLER, DIETMAR;BENZINGER, HERBERT;KARCHER, WOLFRAM;PUSCH, CATHARINA;SCHREMS, MARTIN;FAUL, JUERGEN 发明人 TEMMLER, DIETMAR;BENZINGER, HERBERT;KARCHER, WOLFRAM;PUSCH, CATHARINA;SCHREMS, MARTIN;FAUL, JUERGEN
分类号 H01L21/8242;H01L27/108 主分类号 H01L21/8242
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