发明名称 BASE ISOLATION STRUCTURE
摘要 PROBLEM TO BE SOLVED: To provide a base isolation structure having the stable base isolating characteristic hardly affected by the difference in temperature caused by the change of seasons. SOLUTION: In this base isolation structure formed by a composite laminate obtained by alternately laminating hard plates having rigidity and soft plates having visco-elastic property, the soft plate having the visco-elastic property is formed by a polymer prepared by photopolymerizing a composition including (A) 100 pts.wt. of alkyl (metha) acrylate having 2-20C alkyl group, (B) 3-100 pts.wt. of natural rubber and/or synthetic rubber, (C) 0.01-5 pts.wt. of crosslinking agent or a crosslinkable monomer, and (D) 0.01-5 pts.wt. of photopolymerization starting agent.
申请公布号 JP2001124124(A) 申请公布日期 2001.05.08
申请号 JP19990302637 申请日期 1999.10.25
申请人 SEKISUI CHEM CO LTD 发明人 SUGITA TAIHEI
分类号 E04B1/36;B32B27/30;E04H9/02;F16F1/40;F16F15/04;(IPC1-7):F16F1/40 主分类号 E04B1/36
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