发明名称 METHOD AND DEVICE FOR CLEANING CONDUCTIVE SUBSTRATE FOR ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND METHOD FOR MANUFACTURING ELECTROPHOTOGRAPHIC PHOTORECEPTOR
摘要 PROBLEM TO BE SOLVED: To surely and easily clean a conductive substrate for an electrophotographic photoreceptor without using on organic solvent, pure water, and surface active agent- containing water, and to form a photosensitive layer without generating coating defects, such as cissing and stains, causing image defects. SOLUTION: After suspending a substrate 7 from a frame 6 of a cover 5, the cover 5 is brought into close contact with an opening 4a of a container main body 4 from the upper side to airtightly seal the internal space 4b of the container main body 4. Liquid carbon dioxide is supplied from a tank 8 by a booster pump 9, and then is heated up to 40 deg.C or above by a heater 10 to be brought into a supercritical state. Subsequently, pressure of the carbon dioxide is adjusted by a pressure transducer 11 to be forcibly fed into the internal space 4b of the container main body 4. The supercritical carbon dioxide that is fed forcibly comes into contact with the substrate 7, thereby dissolving moisture, organic substances and other impurities, which adhere to the substrate 7, in the supercritical carbon dioxide. After cleaning is finished, the cover 5 is removed from the container main body 4 to obtain a cleaned substrate 7.
申请公布号 JP2001121094(A) 申请公布日期 2001.05.08
申请号 JP19990305236 申请日期 1999.10.27
申请人 SHARP CORP 发明人 TAKEDA YUKO;SAKAMOTO MASAYUKI;SUGIMURA HIROSHI
分类号 B08B3/08;G03G5/00;(IPC1-7):B08B3/08 主分类号 B08B3/08
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