发明名称 Semiconductor device with an undulating base region and method therefor
摘要 A transistor (30) uses a single continuous base region (40) with an undulating structure. The semiconductor device is an insulated gate field effect transistor having a semiconductor substrate with a plurality of doped base branches, which extend into the semiconductor substrate, form into a single base region for the entire transistor. Each of the plurality of base branches (82) is undulating and of substantially constant width, and each of the base branches undulates in-phase with the immediately adjacent base branches. A continuous gate layer (34) overlies the semiconductor substrate and is self-aligned to the plurality of base branches. The undulating structure of the base region improves channel density, and thus lowers on-resistance, and the use of a single base region ensures that all portions of the base region throughout the device will be at a substantially constant electric potential.
申请公布号 AU1211701(A) 申请公布日期 2001.05.08
申请号 AU20010012117 申请日期 2000.10.18
申请人 SEMICONDUCTOR COMPONENTS INDUSTRIES, L.L.C. 发明人 PRASAD VENKATRAMAN;ALI SALIH
分类号 H01L29/06;H01L29/423;H01L29/78 主分类号 H01L29/06
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