发明名称 NEW ONIUM SALT, PHOTOACID GENERATOR FOR RESIST MATERIAL, RESIST MATERIAL AND PATTERNING METHOD
摘要 PROBLEM TO BE SOLVED: To obtain a chemical amplification type resist material having high resolution. SOLUTION: This onium salt is represented by general formula (1) [wherein R1 is a 1-10C stratght-chain, brunched or cyclic substituted or unsubstituted alkyl group or 6-14C substituted or unsubstituted aryl group; R2 which may be the same or different and denotes hydrogen atom, a 1-6C straight-chain, branched or cyclic substituted or unsubstituted alkyl group; (p) is an integer of 1-5 and (q) is an integer of 0-4 and p+q=5; R3 which may be the same or different and denotes a 1-10C straight-chain, branched or cyclic substituted or unsubstituted alkyl group or a 6-14C substituted or unsubstituted aryl group; M is sulfur atom or iodine atom and when is sulfur atom, (a) is 3 and when M is iodine atom, (a) is 2].
申请公布号 JP2001122850(A) 申请公布日期 2001.05.08
申请号 JP20000245564 申请日期 2000.08.14
申请人 SHIN ETSU CHEM CO LTD 发明人 OSAWA YOICHI;WATANABE ATSUSHI;KUSAKI WATARU;WATANABE SATOSHI;NAGATA TAKASHI;NAGURA SHIGEHIRO
分类号 G03F7/004;C07C309/72;C07C381/12;C08F12/24;C08K5/42;C08L25/16;C08L101/00;G03F7/039;H01L21/027 主分类号 G03F7/004
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