Methods for forming contact holes having sidewalls with smooth profiles

摘要

A method for forming an electronic device includes the steps of forming a first insulating layer on a substrate, forming a patterned conductive layer on the first insulating layer, and forming a second insulating layer on the first insulating layer and on the patterned conductive layer. A contact hole is formed through the first and second insulating layers exposing a portion of the substrate and a portion of the patterned conductive layer so that sidewalls of the contact hole including the exposed portion of the patterned conductive layer have a smooth profile through the first and second insulating layers. An insulating spacer is then formed on the contact hole sidewalls having the smooth profile.