发明名称 |
Method and apparatus for generating a plasma |
摘要 |
A method and apparatus for generating a plasma by inductively coupling electromagnetic energy into the plasma. In one embodiment, first and second antenna coils are disposed about the circumference of the plasma containment area. The first and second antenna coils are relatively spaced along the longitudinal axis of the plasma containment area. A current is generated in the first and second antenna coils. A phase shift regulating network establishes a difference between the phase of the current in the first antenna and the phase of the current in the second antenna. The phase difference corresponds to the phase difference required to launch a helicon wave in the plasma. In a second embodiment, a chamber shield is made of a conductive material and is coupled to the RF source such that the shield functions as an RF antenna. The shield may be coupled in series to a coil surrounding the shield to increase the resultant flux density.
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申请公布号 |
US6228229(B1) |
申请公布日期 |
2001.05.08 |
申请号 |
US19980049839 |
申请日期 |
1998.03.27 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
RAAIJMAKERS IVO J.;STIMSON BRADLEY O.;FORSTER JOHN |
分类号 |
H05H1/46;C23C14/34;H01J37/32;H01L21/203;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):C23C14/34;H05H1/24 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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