METHOD OF MANUFACTURING Ge-Sb-Te SPUTTERING TARGET MATERIAL

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a Ge-Sb-Te sputtering target material for a thin film medium which records information by using the phase transformation of a recording layer material. SOLUTION: The method of manufacturing the Ge-Sb-Te sputtering target material comprises steps of: preparing a powder fabricated by rapidly cooling a raw material containing Ge, Sb and Te by inert gas atomization; performing cold or warm compaction by using, among particles of the above powder, particles having >=20μm particle size and also having a particle size distribution where specific surface area per unit weight is <=300 mm2/g; and sintering the resultant green compact.