| 摘要 |
PROBLEM TO BE SOLVED: To provide an oxide substrate useful for producing an epitaxial film by which an eqitaxial film having quality nearly equal to that of the conventional epitaxial film can be obtained at low cost, and to provided a method of producing the epitaxial film. SOLUTION: The surface of the oxide substrate useful for producing an epitaxial film is a non-mirror surface having an arithmetic mean roughness (Ra), prescribed by JISB0601-1994, of >0.02μm. The method of producing the epitaxial film is comprised of epitaxially growing a film on an oxide substrate having such a nonmirror surface.
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