Wafer handling apparatus for transferring a wafer to and from a process chamber

摘要

A wafer handling apparatus prevents polymers from sticking to the handler which conveys a wafer into/from a process chamber in which the wafer is treated. The wafer handler has an arm which is rotatably driven and an effector integral with the arm. The wafer is supported on the effector via a vacuum chuck formed by vacuum holes in the effector. The temperature of the handler is controlled to be identical to that inside the process chamber. The temperature controlling system has an electric heater for heating the effector and a current supplying apparatus which intermittently supplies current to the heater to maintain the temperature of the effector. Because the temperature of the handler is maintained at least as high as that inside the process chamber, polymers floating in the process chamber are prevented from sticking to the handler.