| 摘要 |
PURPOSE: A vapor deposition system having a chamber alignment device is provided to simplify a chamber alignment process by changing a structure of a chamber alignment device. CONSTITUTION: A vapor deposition system having a chamber alignment device comprises a process chamber(10), a cryo pump(50), a system pump(60), a laughing valve(70), and a valve board(80). The cryo pump(50) and the system pump(60) control a vacuum degree of the process chamber(10). The laughing valve(70) is connected between the process chamber(10) and the system pump(60). The valve board(80) provides the air to the cryo pump(50) and the laughing valve(70). The first line connects the valve board(80) with the cryo pump(50). The second line connects the valve board(80) with the laughing valve(70). The third line is connected with the first and the second lines. A switch(150) is installed on the third line.
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