| 摘要 |
PURPOSE: A susceptor system for semiconductor manufacturing equipment is provided to prevent depositing errors in a deposition process by using an N2 gas supplied through an N2 supply line. CONSTITUTION: A susceptor system comprises a heater, a susceptor(10), a vacuum supply line(18), and an N2 supply line. The heater transfers the heat to a wafer. The susceptor(10) is arranged on the heater. The vacuum line is formed with a vacuum hole(12), a plurality of vacuum ring(14), and a connection groove(16). The N2 supply line is formed with an N2 supply ring(22) and an N2 supply hole. The vacuum hole(12) is formed within the susceptor(10) and penetrates a center portion of the susceptor(10). The vacuum rings(14) are arranged on a concentric circle of the vacuum hole(12). The connection groove(16) connects the vacuum hole(12) with the vacuum ring(14). The N2 supply ring line is formed at an outer portion of the vacuum supply line within the susceptor(10). The N2 supply hole is formed within the susceptor(10) and penetrates the center portion of the susceptor(10).
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