| 摘要 |
PURPOSE: A multi-chamber for manufacturing a semiconductor is provided to prevent pollution of a sensor installed at a robot arm by using a sensor cover. CONSTITUTION: A multi-chamber comprises a load-lock chamber, a process chamber, a robot arm, a sensor(28), and a drive source. The load-lock chamber loads or unloads a wafer. The process chamber is installed at a position adjacent to the load-lock chamber. The robot arm transfers the wafer to process chamber and the wafer of the process chamber to the load-lock chamber. The sensor(28) senses the wafer within robot arm. The drive source controls the robot arm. The robot arm further comprises a sensor cover(40) for preventing pollution of the sensor(28).
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