| 摘要 |
PURPOSE: A gas purifier of ultra high purity is provided, which can purify commercially available purified gas of the highest purity of 5-6N up to ultra high purity of 7N up(higher than 99.99999%) The ultra high purity gas is expensive 3-5 times over the commercially available gas and needed for those who uses this kind of ultra high purity of 7N up. CONSTITUTION: The system comprises the followings: (i) a gas supply device for supplying selectively high purity gas for purifying and gas for reducing a metal trap (36), the metal trap being an active metal as Ni, Cu, Si, Ti, Li, Mg and Al in the form of metal chip or metal powder; and (ii) a gas purifying device that includes a stainless tube and a transparent quartz tube (31) filled with a metal trap, for removing impurities contained in the high purity gas for purification by oxidation and reaction at a state of heated to a fixed temperature and for reducing or regenerating the oxidized or contaminated metal trap with metal trap reduction gas by reducing gas.
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