| 摘要 |
PURPOSE: A wet etching system is provided to prevent a work error beforehand, by detecting whether chemical liquid is supplied in a process for supplying the chemical liquid, and by informing an operator of the detection result. CONSTITUTION: Chemical liquid is contained in a wet process bath(12) and a wafer is loaded in the wet process bath so that a wet etching process is performed in the bath. A sensor for measuring density detects density variation of the chemical liquid of the wet etching bath per an interval of time during which the wet process bath is used. A controller(40) receives a measurement value detected from the sensor for measuring the density, and generates a control signal. A chemical liquid supply unit supplies the chemical liquid to the wet process bath through a supply line(24) according to the control signal generated from the controller. A detecting unit(30) is installed in the supply line to detect the chemical liquid flowing through the supply line, and determines whether the chemical liquid is normally supplied to the wet process bath.
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