| 摘要 |
PURPOSE: A dust remover of reticle used for a semiconductor exposure process is provided which automatically removes dusts from the reticle, considerably reduces time required for the process, prevents the reticle from being damaged and also improves working productivity. CONSTITUTION: The dust remover comprises: (i) a caved-in frame(10) having a reticle carrying-in hole(12) and an exhaust pipe(14); (ii) a reticle transfer means(20) which safely arrives the reticle at a safe-receipt stand through the reticle carrying-in hole and carries in and out the reticle; and (iii) air ejecting machines(42, 44) which are installed on the inside of the reticle carrying-in hole(12) to eject high-pressure air to the reticle. A ventilating fan(50) which forcibly exhausts dusts separated from the reticle by the air ejecting machines is further connected to the exhaust pipe(14). |
