GAS DISTRIBUTION PLATE OF DRY ETCHING EQUIPMENT

摘要

PURPOSE: A gas distribution plate of a dry etching equipment is provided to reduce manufacturing cost, by improving etching uniformity in a wafer in the dry etching equipment, and by making the gas distribution plate used semi-permanently. CONSTITUTION: A gas distribution plate(21) is composed of a circular plate having a plurality of gas spraying holes(23) in a body of the circular plate. The gas spraying holes are uniformly distributed in a central portion and a peripheral portion. The body is composed of aluminum coated with an oxide layer. The gas spraying holes are radially symmetrical.