APPARATUS FOR PREVENTING OVERHEAT AND POLLUTION OF SEMICONDUCTOR CHEMICAL VAPOR DEPOSITION EQUIPMENT

摘要

PURPOSE: An apparatus for preventing overheat and pollution of a semiconductor chemical vapor deposition equipment is provided to protect each component by intercepting indirect heat from a heater. CONSTITUTION: An apparatus for preventing overheat and pollution of semiconductor CVD equipment comprises an index table(2), a susceptor(3), a heater(4), and a controller(5). The index table(2) is rotated to load a wafer within a process chamber(1). The susceptor(3) is arranged on the index table(2) according to a constant interval. The heater(4) is installed an upper side of the susceptor(3) in order to generate the heat. The controller(5) is installed within the heater(4). The apparatus further comprises a cooling plate(11) for intercepting the indirect heat from the heater(4) and a cover plate(12) for protecting the controller(5).