发明名称 |
APPARATUS FOR EXHAUSTING LOADLOCK CHAMBER OF DRY ETCHER |
摘要 |
PURPOSE: An apparatus for exhausting a loadlock chamber of a dry etcher is provided to intercept a back stream caused by pressure difference between chambers and to effectively prevent particles from being induced by the back stream, by connecting two loadlock chambers with a vacuum line. CONSTITUTION: An exhaust line(21) of an input loadlock chamber(11) and an exhaust line(23) of an output loadlock chamber(13) are unite and connected to a vacuum line(25) having a vacuum pump(27). A switching valve is installed in the respective exhaust lines. The respective exhaust lines includes a back stream prevention unit.
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申请公布号 |
KR20010035565(A) |
申请公布日期 |
2001.05.07 |
申请号 |
KR19990042197 |
申请日期 |
1999.10.01 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
OH, JEONG SEOK |
分类号 |
H01L21/306;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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