发明名称 |
LOADLOCK CHAMBER OF DRY ETCHING EQUIPMENT |
摘要 |
PURPOSE: A loadlock chamber of a dry etching equipment is provided to prevent particles from being adhered to a wafer, by making the particles inside the loadlock chamber exhausted along with air through a central portion of the wafer. CONSTITUTION: A loadlock chamber has a transfer arm and a pumping hole(35) which is a connection point with a vacuum line. The transfer arm is installed to transfer a wafer(20) between a process chamber and the loadlock chamber, and the wafer is loaded in the transfer arm. A plurality of the pumping holes are formed in a peripheral portion of the loadlock chamber.
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申请公布号 |
KR20010035558(A) |
申请公布日期 |
2001.05.07 |
申请号 |
KR19990042190 |
申请日期 |
1999.10.01 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
OH, JEONG SEOK |
分类号 |
H01L21/306;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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