发明名称 LOADLOCK CHAMBER OF DRY ETCHING EQUIPMENT
摘要 PURPOSE: A loadlock chamber of a dry etching equipment is provided to prevent particles from being adhered to a wafer, by making the particles inside the loadlock chamber exhausted along with air through a central portion of the wafer. CONSTITUTION: A loadlock chamber has a transfer arm and a pumping hole(35) which is a connection point with a vacuum line. The transfer arm is installed to transfer a wafer(20) between a process chamber and the loadlock chamber, and the wafer is loaded in the transfer arm. A plurality of the pumping holes are formed in a peripheral portion of the loadlock chamber.
申请公布号 KR20010035558(A) 申请公布日期 2001.05.07
申请号 KR19990042190 申请日期 1999.10.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 OH, JEONG SEOK
分类号 H01L21/306;(IPC1-7):H01L21/306 主分类号 H01L21/306
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