METHOD FOR CONTROLLING FLOW RATE AND OIL PRESSURE OF CLEANING SOLUTION PROVIDED TO SEMICONDUCTOR EQUIPMENT

摘要

PURPOSE: A method for controlling a flow rate and an oil pressure of a cleaning solution provided to a semiconductor equipment is provided to control the flow of the deionized water by using a multitude of valve system. CONSTITUTION: The deionized water is provided from a deionized water tank to a supply pipe. A pressure portion applies a pressure to the deionized water provided through the supply pipe. A flow rate portion controls a flow rate of the pressed deionized water by using a manual valve. Impurities of the controlled deionized water are filtered by a filter. An oil pressure of the deionized water is measured. The filtered deionized water is provided to a cleaning pipe through a distribution pipe. The flow rate of the deionized water is controlled by using an air valve. A wafer is cleaned. A pressure of the distribution pipe is controlled by using a proportional control valve. The deionized water is cycled and stored to the tank.