发明名称 |
Apparatus and method for wet cleaning or etching a flat substrate |
摘要 |
An apparatus for wet cleaning or etching of flat substrates comprising a tank with an inlet opening and outlet opening for said substrates. Said tank contains a cleaning liquid and is installed in a gaseous environment. At least one of the openings is a slice in a sidewall of the tank and is present below the liquid-surface. In the tank there may be a portion above the liquid filled with a gas with a pressure being lower than the pressure within said environment. The method comprises the step of transferring a substrate through the cleaning or etching liquid at a level underneath the surface of said liquid making use of said apparatus.
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申请公布号 |
US2001000575(A1) |
申请公布日期 |
2001.05.03 |
申请号 |
US20000751569 |
申请日期 |
2000.12.29 |
申请人 |
MEURIS MARC;MERTENS PAUL;HEYNS MARC |
发明人 |
MEURIS MARC;MERTENS PAUL;HEYNS MARC |
分类号 |
B08B1/00;H01L21/00;H01L21/304;H01L21/306;(IPC1-7):B08B3/04 |
主分类号 |
B08B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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