METHOD AND APPARATUS FOR MONITORING PROCESS EXHAUST GAS, SEMICONDUCTOR-MANUFACTURING DEVICE, AND METHOD AND SYSTEM FOR MANAGING SEMICONDUCTOR-MANUFACTURING DEVICE

摘要

Process exhaust gas is collected to analyze its components using a Fourier transform spectroscope (FT-R) (26). The results of analysis are compared with the reference values derived from a process carried out under reference process conditions. If the amount of any analyzed component exceeds a predetermined range with respect to the reference values, a signal indicative of trouble in the process is produced. Alternatively, the process conditions may be automatically controlled instead of producing such a signal indicative of trouble.