RELIEF AND GRAPHICS METHOD, APPARATUS AND PRODUCT

摘要

A system, embossing station, and method for producing a combination of graphics and a relief on a substrate, and the product produced thereby. The system has at least one print station (12) having a first substrate path, and at least one embossing station (14) having a second substrate path. The second substrate path of the at least one embossing station (14) has a coating device (16) an embossing device (40), and a curing device (60). The coating device (16) is located at a first location along the second substrate path and the embossing device (40) is located at a second location along the second substrate path, the second location being spaced from the first location. The curing device (60) is located at a third location along the second substrate path. The second and third locations can be located on either opposite sides of the second substrate path or on a common side of the second substrate path. The curing device (60) can be an actinic radiation source, such as an ultraviolet light source or an electronic beam source.