发明名称 FLOW RESISTANCE DEVICE
摘要 <p>The flow resistance device (7) for controlling flow rate and reducing fluid pressure causes the fluid of extremely high pressure to have the flow rate and pressure reduced to a desired level. The flow resistance device (7) consists of a cylindrical disc stack constituted by a plurality of identical circular discs (15) axially stacked to control the flow of fluids between fluid inlet through holes (43) and outlet through-holes (48). The discs (15) have a plurality of T-shaped through-holes (44-46, 49-51) and rectangular through-holes (52-57) arranged at the same angle and interval. The discs (15) are stacked being individually rotated at a predetermined angle and combined together in an overlapping relationship. Thus a three-dimensional tortuous flow path structure and a plurality of vortex generating spaces (30-37) are created, which decrease the kinetic energy of the fluid passing through the flow resistance device (7), and the peak frequency for the noise is shifted to a higher frequency level, with a minimum of noise, vibration, cavitation, abrasion, corrosion and blocking with foreign materials in the flow resistance device (7) and equipment using the same.</p>
申请公布号 WO2001031242(A1) 申请公布日期 2001.05.03
申请号 KR2000001102 申请日期 2000.10.04
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