发明名称 |
Method of stabilizing anti-reflection coating layer |
摘要 |
A method of stabilizing an anti-reflection coating (ARC) layer is disclosed. The method provides a substrate with a dielectric layer, a conductive layer, and the ARC layer formed thereon. The ARC layer is treated in an alloy treatment step prior to forming a photoresist layer over the ARC layer, so that the specificity of the ARC layer is stabilized to allow accurate transfer of a desired pattern. A photomask with the desired pattern is provided, while a photolithographic process is then performed to transfer the pattern onto the wafer.
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申请公布号 |
US6225219(B1) |
申请公布日期 |
2001.05.01 |
申请号 |
US19990467260 |
申请日期 |
1999.12.20 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
LEE KAN-YUAN;HORNG WEICHING;KO JOE;HONG GARY |
分类号 |
G03F7/09;H01L21/027;H01L21/3105;H01L21/3213;(IPC1-7):H01L21/44 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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