| 发明名称 |
Aqueous ammonium fluoride and amine containing compositions for cleaning inorganic residues on semiconductor substrates |
| 摘要 |
A semiconductor wafer cleaning formulation for use in post plasma ashing semiconductor fabrication comprising the following components in the percentage by weight ranges shown:
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| 申请公布号 |
US6224785(B1) |
申请公布日期 |
2001.05.01 |
| 申请号 |
US19970924021 |
申请日期 |
1997.08.29 |
| 申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
WOJTCZAK WILLIAM A.;GUAN GEORGE;FINE DANIEL N.;FINE STEPHEN A. |
| 分类号 |
C09K13/00;C11D7/10;C11D7/26;C11D7/32;C11D7/34;C11D11/00;G03F7/42;H01L21/306;(IPC1-7):C09K13/00;C09K13/06;C09K13/08 |
主分类号 |
C09K13/00 |
| 代理机构 |
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