Method and apparatus for holographically recording an essentially periodic pattern

摘要

The present invention relates to a method and an apparatus for holographically recording periodic or quasi-periodic features of a mask in a holographic recording layer. In holographic lithography the object beam is directed to the first substrate bearing a holographic recording layer such that it passes the mask substrate and interferes with a reference beam in the recording layer to form a hologram of the mask pattern. According to the new method the object beam is directed to the second substrate at an off-axis angle and the wavelength used and/or the angle of incidence of the object beam are selected according to the period of the features to be recorded such that essentially just the zero and one of the first diffraction orders are present for forming the hologram.