| 发明名称 |
Photosensitive resin, resist based on the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure method |
| 摘要 |
Provided is a photosensitive resin with high sensitivity to exposure light. The photosensitive resin comprises a vinyl monomer moiety having an alicyclic group in a side chain thereof, and a sulfonyl moiety.B is an alicyclic group,
|
| 申请公布号 |
US6225019(B1) |
申请公布日期 |
2001.05.01 |
| 申请号 |
US19990244162 |
申请日期 |
1999.02.04 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
MATSUDA MINORU;MAEHARA HIROSHI;SAKAI KEITA |
| 分类号 |
H01L21/027;C08G75/22;G03F7/004;G03F7/039;H01L21/312;(IPC1-7):G03F7/004;C08G75/20;C08F283/00 |
主分类号 |
H01L21/027 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
