发明名称 Plasma enhanced chemical deposition with low vapor pressure compounds
摘要 Generally, the apparatus of the present invention is (a) a flash evaporation housing with a monomer atomizer for making monomer particles, heated evaporation surface for making an evaporate from the monomer particles, and an evaporate outlet, connected to (b) a glow discharge electrode creating a glow discharge plasma from the evaporate, wherein (c) the substrate is proximate the glow discharge plasma for receiving and cryocondensing the glow discharge plasma thereon. The method of the present invention has the steps of (a) flash evaporating a liquid monomer an evaporate outlet forming an evaporate; (b) passing the evaporate to a glow discharge electrode creating a glow discharge monomer plasma from the evaporate; and (c) cryocondensing the glow discharge monomer plasma on a substrate and crosslinking the glow discharge plasma thereon, wherein the crosslinking results from radicals created in the glow discharge plasma and achieves self curing.
申请公布号 US6224948(B1) 申请公布日期 2001.05.01
申请号 US19970939594 申请日期 1997.09.29
申请人 BATTELLE MEMORIAL INSTITUTE 发明人 AFFINITO JOHN D.
分类号 C08F20/12;B05D7/24;C23C16/448;C23C16/50;(IPC1-7):C23C16/448 主分类号 C08F20/12
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