发明名称 |
Ozone-processing apparatus for semiconductor process system |
摘要 |
An ozone-processing apparatus for a semiconductor process system includes an airtight process chamber and a lamp chamber, which are partitioned by a window for transmitting ultraviolet rays. A plurality of ultraviolet-ray lamps is arrayed along the window in the lamp chamber. A measurement space is defined between the window and the lamps in the lamp chamber. The lamp chamber is provided with a mount portion to set up a measuring unit therein. The measuring unit includes a sensor to be inserted into the measuring space, for measuring the light quantity of the lamps. The sensor is movable in a direction in which the lamps are arrayed.
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申请公布号 |
US6224934(B1) |
申请公布日期 |
2001.05.01 |
申请号 |
US20000587571 |
申请日期 |
2000.06.06 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HASEI MASAAKI;ISHIKAWA KENJI;SHOU QIAN SHAO;NAKANO TETSUYA |
分类号 |
H01L21/31;C01B13/10;C30B33/00;H01L21/00;(IPC1-7):C23C16/00 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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