发明名称 Device for treating containers with a low pressure plasma and an associated vacuum circuit of economic and reliable design
摘要 A device for treating a container (30) with a low pressure plasma, created by excitation of a gas with electromagnetic waves, incorporates at least one treatment station (14) consisting of a fixed cavity (32) which is connected to a depressurising source by a vacuum circuit (74), of the type in which the treatment station (14) includes a mobile cover (34) provided with a means for supporting the container (30) in such a manner that the container (30) is introduced into the cavity (32) by displacing this cover (34). The device is characterised in that the cover (34) incorporates a linking channel (64) which, whilst the cover (34) is in position sealing the cavity (32), puts the cavity (32) in communication with a fixed extremity (68) of the vacuum circuit (74).
申请公布号 FR2799994(A1) 申请公布日期 2001.04.27
申请号 FR19990013638 申请日期 1999.10.25
申请人 SIDEL SA 发明人 RIUS JEAN MICHEL
分类号 H05H1/46;B65D1/00;B65D25/02;C23C16/04;C23C16/455;C23C16/50;C23C16/505;H01J37/32;(IPC1-7):B05B7/24;C23C16/458;C23C16/513 主分类号 H05H1/46
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