METHOD FOR IMPROVING OPTICAL QUALITY OF 45° MICRO-MIRROR DEVICE

摘要

PROBLEM TO BE SOLVED: To improve the optical quality of a 45 deg. micro-mirror device. SOLUTION: An alkaline aqueous solution is prepared as an etching solution and controlled to 55-95 deg.C. A silicon wafer is etched with the solution under stirring and vibration to form a micro-mirror 20 on the <111> face having 45 deg. angle. This method improves the optical quality of the resulting 45 deg. micro- mirror device. When a laser diode 10 and another optical sensor are bonded to the silicon substrate 30, the micro-mirror 20 is applicable to a thin optical pickup head.