| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an instrument for film thickness measurement which can measure the thickness of even a film with distinctive absorption and reflection spectra by using a light interferometer. SOLUTION: This is a method for irradiating a light-transmissive or light- translucent film with light and measuring the thickness by making use of interference caused by an optical path difference correlating to the film thickness. The film to be measured which causes interference when transmitting light is irradiated with the light to find the 1st waveform of the spectrum of the luminous flux interferring after being transmitted and a film as an object of comparison which causes not interference when transmitting the light and is made of the same material with the film to be measured is irradiated with light to find the 2nd waveform of the spectrum of luminous flux having no interference after being transmitted; and the correction spectrum found by operating the 1st waveform and 2nd waveform is used to measure the film thickness and this film thickness measuring instrument uses this film thickness measuring method.
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