| 摘要 |
PROBLEM TO BE SOLVED: To obtain an insulating film evaluation test structure which is capable of easily detecting fault points. SOLUTION: An insulating film evaluating test structure is provided with a CCD structure equipped with a semiconductor substrate 1, a gate-insulating film 2 formed on all the main surface of the substrate 1 to be detected, gate electrodes 3a to 3i which are arranged at regular intervals on the gate insulating film 2, a wiring 20 connected to the gate electrodes 3a, 3d, and 3g, a wiring 21 connected to the gate electrodes 3b, 3e, and 3h, and a wiring 22 connected to the gate electrodes 3c, 3f, and 3i. Furthermore, the insulating film evaluating test structure is equipped with a read-out circuit 5 composed of an inverter 4 and others and is connected to the output stage of the CCD structure. |
