发明名称 DEVICE FOR TREATING GLASS SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide the treating device of a glass substrate for controlling an atmospheric temperature in a container to a proper value without increasing the volume of the container for accommodating a heating device. SOLUTION: The device for treating a glass substrate that heat-treats a glass substrate 10 where a substance requiring heat treatment has been applied to one surface is provided with a heating device 202 for placing the glass substrate 10 for heating, a container 1 for accommodating the heating device, gas supply nozzles 110-116 for supplying gas into the container 1, a gas exhaust duct 118 that is arranged at the ceiling part of the container and unloads gas being heated by the heating device from the inside of the container, and a control mechanism 304 for controlling the atmospheric temperature in the container by controlling the amount of gas being supplied by the gas supply nozzles and the amount of gas being unloaded from the gas exhaust duct.</p>
申请公布号 JP2001116461(A) 申请公布日期 2001.04.27
申请号 JP19990292326 申请日期 1999.10.14
申请人 CANON INC 发明人 YAMAGUCHI TAKEHITO
分类号 G02B5/20;F27B9/10;F27B9/40;(IPC1-7):F27B9/10 主分类号 G02B5/20
代理机构 代理人
主权项
地址