发明名称 SUBSTRATE WASHING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent impurities such as organic ones from entering when introducing clean room air into a washing chamber, and at the same time efficiently unload air in the washing chamber even when a substrate is being rotated speedily. SOLUTION: In the washing device that at least has a washing chamber 101 being shielded from the fresh air, and washes a substrate 109 in the washing chamber 101, pressure in the washing chamber 101 is reduced as compared with the atmospheric pressure, thus allowing air to flow in a fixed direction from the upper portion to the lower one in the washing chamber 101 and efficiently unloading air when the substrate 102 is being rotated speedily.
申请公布号 JP2001118822(A) 申请公布日期 2001.04.27
申请号 JP19990294141 申请日期 1999.10.15
申请人 UCT KK 发明人 YAMAGUCHI YOSHIAKI;NITTA TAKEHISA
分类号 B08B5/00;F04B9/00;H01L21/304;(IPC1-7):H01L21/304 主分类号 B08B5/00
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