| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method and a plant for removing gaseous fluorocompounds or fluorosulfides, e.g. CF4, C2F6 and SF6, existing in a flow of xenon and/or krypton by transmission through one or more polymer film. SOLUTION: Xenon and/or krypton is refined or separated by low temperature distillation. Purities, especially hydrocarbon, is removed before entering a transmission process through oxidizing catalytic action and following adsorption of produced carbon dioxide and water. Refined mixture of xenon/krypton containing no gaseous fluorocompound or fluorosulfide is especially used as a plasma accelerating gas for satellite or an insulating gas in a hermetically sealed unit, especially a double plate glass window.</p> |
