发明名称 METHOD FOR MANUFACTURING INTEGRATED THIN-FILM SOLAR CELL
摘要 <p>PROBLEM TO BE SOLVED: To provide a method of manufacturing an integrated thin film solar cell, capable of maintaining high patterning accuracy and attaining processing speed higher than laser scribe methods, even if the substrate of the solar cell has a large area. SOLUTION: This method of manufacturing an integrated thin film solar cell, where a plurality of solar battery cells, formed of an amorphous silicon semiconductor on a translucent insulating substrate, are connected in series, comprises a step of depositing a back-side electrode layer made of a metal thin film on the amorphous silicon semiconductor, and a step of mechanically dividing the deposited back-side electrode layer by mechanical cutting means and patterning the divided back-side electrodes. As a result, the back-side electrodes formed on the amorphous silicon semiconductor can be patterned mechanically, without having to cut the underlying amorphous silicon semiconductor, with higher processing accuracy and at higher processing speed than by conventional laser scribe methods, even if the substrate has a larger area.</p>
申请公布号 JP2001119048(A) 申请公布日期 2001.04.27
申请号 JP19990300607 申请日期 1999.10.22
申请人 SHARP CORP 发明人 TANAMURA HIROMASA
分类号 H01L31/04;(IPC1-7):H01L31/04 主分类号 H01L31/04
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