| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron beam transfer aligner which has a long life at low cost, by enabling the transfer exposure of a fine pattern of 0.1μm or under. SOLUTION: An electron beam transfer device is one which applies an electric field between mask plates 11 and 12 and transfer plates 13 and 14, and convergently applies the electrons emitted from that mask plate onto the electron beam resist film 14 of the transfer plate 13 through a magnetic field lens 16. As a mask plate, an electron self emission plate, which has a field emission element 12 made in the form of a pattern being a flat surface on one substrate 11, is utilized.
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