Device for magnetron sputtering has an outer plasma electrode with a first potential arranged between a target and a counter electrode with a second potential

摘要

Device has an outer plasma electrode (9) with a first potential arranged between a target (1) and a counter electrode (10) with a second potential. An inner plasma electrode (8) with a third potential is arranged in the center of the target within the target region limited by the erosion zone. A screening electrode (11) with a forth potential open to the substrate is arranged on a vacuum flange (6) and surrounds the target, counter electrode, outer plasma electrode and inner plasma electrode. A number of gas outlet openings (12,13) are located on the inner plasma electrode and/or the outer plasma electrode. Plasma screens are located on the inner and/or the outer plasma electrodes to cover the gaps (34,35) to the target.