发明名称 |
Novolac polymer planarization films with high temperature stability |
摘要 |
A process for forming a planarization film on a substrate that does not smoke or fume on heating includes applying a polymeric solution including a novolac resin having a weight average molecular weight between about 1000 and 3000 amu, which has been fractionated to remove molecules with molecular weight below about 350 amu, a surfactant selected from a group consisting of a non-fluorinated hydrocarbon, a fluorinated hydrocarbon and combinations thereof, and an optional organic solvent to a substrate, followed by heating the substrate.
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申请公布号 |
US2001000515(A1) |
申请公布日期 |
2001.04.26 |
申请号 |
US20000735838 |
申请日期 |
2000.12.12 |
申请人 |
HACKER NIGEL;KRAJEWSKI TODD;SPEAR RICHARD |
发明人 |
HACKER NIGEL;KRAJEWSKI TODD;SPEAR RICHARD |
分类号 |
G03F7/11;B29C41/24;C09D161/06;G03F7/023;G03F7/09;H01L21/027;(IPC1-7):B05D5/12;C08K5/02;C08L61/10 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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