ABATEMENT OF EFFLUENTS FROM CHEMICAL VAPOR DEPOSITION PROCESSES USING ORGANOMETALLICSOURCE REAGENTS

摘要

A method and apparatus for abatement of effluent from a CVD process using a source reagent having a metal organic loosely bound to an organic or organometallic molecule such that upon exposure to heat (36) such bond is readily cleavable, e.g., copper deposition process involving the formation of films on a substrate (32) by metalorganic chemical vapor deposition (CVD) utilizing a precursor composition (16) for such film formation. The abatement process in specific embodiments facilitates high efficiency abatement of effluents from copper deposition processes utilizing Cu(hfac)TMVS as a copper source reagent (14).