发明名称 |
INTEGRATED CIRCUIT WITH AT LEAST ONE CAPACITOR AND METHOD FOR PRODUCING THE SAME |
摘要 |
The invention relates to an integrated circuit with at least one capacitor. Both a first capacitor electrode (P1) and at least a part of a second capacitor electrode (P2) of the capacitor are produced by electroplating in depressions (V1, V2) of an auxiliary layer (H). Then the auxiliary layer (H) is removed and is at least partially replaced by a capacitor dielectric (KD). The first capacitor electrode (P1) and the part of the second capacitor electrode (P2) may consist of a metal, for example platinum. The capacitor dielectric (KD) may consist, for example, of BST.
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申请公布号 |
WO0129900(A1) |
申请公布日期 |
2001.04.26 |
申请号 |
WO2000DE03521 |
申请日期 |
2000.10.06 |
申请人 |
INFINEON TECHNOLOGIES AG;WILLER, JOSEF;HIEROLD, CHRISTOFER |
发明人 |
WILLER, JOSEF;HIEROLD, CHRISTOFER |
分类号 |
H01L21/8242;H01L21/02;H01L27/108;(IPC1-7):H01L29/92 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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