| 摘要 |
<p>An apparatus for processing and deposition includes a dispenser (102) for dispensing a precursor to a vaporizer positioned within a vaporization chamber (105). A delivery conduit joins the vaporization with a process chamber used a plurality of control valves (44). A flow meter (46) is positioned within the delivery conduit for measuring the flow of precursor through the delivery conduit. A flow controller is likewise positioned within the delivery conduit for controlling the flow of precursor in response to the measured flow rate.</p> |
