| 发明名称 |
A METHOD AND APPARATUS FOR TREATING A SUBSTRATE WITH AN OZONE-SOLVENT SOLUTION |
| 摘要 |
A general method and apparatus for treating materials comprising the steps of dissolving ozone gas in a solvent at a predetermined temperature T1 to form an ozone solvent solution produced by the ozonated water supply (22), heating the ozone solvent solution by a heat exchanger (28) to a second predetermined temperature T2 which is greater than T1, and directing the flow of the ozone solvent solution to a dispensing nozzle (36) for treatment of the material (38).
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| 申请公布号 |
WO0128950(A1) |
申请公布日期 |
2001.04.26 |
| 申请号 |
WO2000US29167 |
申请日期 |
2000.10.19 |
| 申请人 |
PHIFER SMITH CORPORATION |
发明人 |
BOYERS, DAVID, G.;CREMER, JAY, THEODORE, JR. |
| 分类号 |
B08B7/00;B08B3/02;B08B3/08;C03C23/00;G03F7/42;H01L21/00;H01L21/304;H01L21/311;H01L21/3213;(IPC1-7):C03C23/00;C23G1/00;C23G1/02;B08B9/00;B08B9/20;B08B3/00;B08B3/10;B08B3/14;F23J1/00 |
主分类号 |
B08B7/00 |
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