| 摘要 |
<p>Reduced pour point ethylene oxide-propylene oxide block copolymer surfactants, pour point depressants for reducing the pour point of such surfactants, and a process for preparing such surfactants, wherein the reduced pour point is achieved without adversely affecting the properties or structure of the parent ethylene oxide-propylene oxide block copolymer surfactant or contributing to the formation of a hazy product. According to the present invention, the pour point of ethylene oxide-propylene oxide block copolymer surfactants may be reduced by mixing a parent ethylene oxide-propylene oxide block copolymer surfactant with a pour point depressant comprising a low molecular weight glycol, water, and a dialkyl sulfosuccinate.</p> |
