PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, RESIST PATTERN AND SUBSTRATE HAVING THE RESIST PATTERN LAMINATED THEREON

摘要

A photosensitive resin composition comprising (A) a photosensitive resin (B) a photopolymerization initiator and (C) a flame retardant, wherein the flame retardant contains a halogen atom or antimony atom in an amount of 5 wt % or less; a photosensitive element using the resin composition; a method for producing a resist pattern using the resin composition; a resist pattern using the resin composition; and a substrate having the resist pattern laminated thereon.